Magnetoresistive multilayer film

ABSTRACT

A magnetoresistive material of the present invention has a structure in which many clusters are surrounded by a crystal phase of Cu and/or Ag, where each cluster has a grain size of 20 nm or less and composed of an amorphous phase containing at least one ferromagnetic metal element T as a main component selected from Fe, Co and Ni, and at least one element M selected from Ti, Zr, Hf, V, Nb, Ta, Mo and W.

This application is a division of application Ser. No. 08/730,278, filedOct. 15, 1996 pending.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to materials for magnetoresistive sensorsused for a magnetic head, particularly a reproducing head, a positionsensor, and an angle sensor.

2. Description of the Related Art

Although a Ni--Fe alloy thin film (permalloy thin film) isconventionally used as a magnetoresistive (MR) material, the permalloyfilm has a rate of change in resistance of 2 to 3%. In the future, inorder to comply with the requirements to narrow the track of a magnetichead and increase the resolution of a magnetic sensor, amagnetoresistive material having a higher rate of change in resistance(MR ratio) is demanded.

The phenomenon referred to as "giant magnetoresistive (GMR) effect" hasrecently been found in Fe/Cr or Co/Cu multilayer thin films (refer to M.N. Baibich et al., Physical Review Letters, Vol. 61 (1988), p2472, D. H.Mosca et al., Journal of Magnetism and Magnetic Materials, Vol. 94(1991), p L1). It is considered that, in such thin films, spin-dependentscattering caused by conduct electrons located in the interface betweenFe and Cr or Co and Cu contributes to the giant magnetoresistive effect.These films basically differ from conventional Ni--Fe thin films in thegeneration mechanism of the magnetoresistive effect. Although a MR ratioof 10% or more is obtained from these thin films, the need for the filmsto have a multilayer structure complicates the production processtherefor.

Thereafter, the same giant magnetoresistive effect was observed in asingle-layer thin film in which ultrafine Co, Fe or Ni grains (grainsize: a few nm) are precipitated in a Cu or Ag matrix, as shown in FIG.6 for prior art using Co, refer to A. E. Berkowitz et al., PhysicalReview Letters, Vol. 68 (1992), p3745, J. Q. Xiao et al., PhysicalReview Letters, Vol. 68 (1992), p3749).

In these materials, the interfaces of Co grains and the Cu(Ag) matrixcontribute to the giant magnetoresistive effect. Therefore, if thenumber of the Co grains precipitated can be increased while maintainingthe size of ultrafine grains, i.e., if the Co content can be increased,the MR ratio is increased due to an increase in the total area of theinterfaces. FIG. 7 shows changes in the rate of change in resistance (MRratio) with the volume fraction of ferromagnetic grains. The changes canbe theoretically predicted with a constant grain size (refer to O. Zhanget al., Applied Physics Letters, Vol. 61 (1992), p1855).

A conventional Cu--Co alloy has the tendency that the grain sizeincreases as the Co content increases.

There is also the tendency that the rate of change in resistancedecreases as the grain size of ferromagnetic Co grains increases, asshown in a theoretical curve of FIG. 8 (refer to S. Zhang et al.,Applied Physics Letters, Vol. 61 (1992), p1855).

Because an increase in the Co (ferromagnetic material) content resultsin increased grain size, and increased grain size results in decreasedresistance, it is therefore impossible to improve the giantmagnetoresistive effect by only increasing the amount of Co(ferromagnetic material).

FIG. 9 shows the Co-content dependence of the rate of change inresistance (MR ratio) of a Cu--Co alloy sputtered thin film. FIG. 9indicates that the rate of change in resistance has a peak at the Cocontent of about 20 at %, and decreases as the Co content increases fromabout 20 at %.

There is also a problem in that if the grain size of ferromagneticgrains increases, the magnetization process is governed by the crystalmagnetic anisotropy of the ferromagnetic grains, thereby increasinghysteresis.

Such a granular GMR material also has another problem with an alloyhaving a high Cu or Ag content (a low content of ferromagnetic metal) inthat, since the respective ferromagnetic grains are spaced and thusmagnetically separated, the alloy exhibits a superparamagnetic behaviorand a gradual change in magnetization with an external magnetic field,and magnetization is thus slowly saturated. Namely, such an alloyrequires a very high magnetic field (saturation magnetic field Hs) forsaturation of the resistance change, which is defined as shown in FIG.10.

Since electric resistance depends upon the relative angle betweenadjacent ferromagnetic grains with a nonmagnetic matrix therebetween, anoverall change in magnetization with an external magnetic fieldcorresponds to a change in electric resistance with the externalmagnetic field.

The conventional material thus has a problem in that the sensitivity ofresistance changes with an external magnetic field is significantly low.

SUMMARY OF THE INVENTION

The present invention has been achieved for solving the above problems,and an object of the present invention is to permit achievement of agiant magnetoresistive effect by granular GMR material effect even ifthe content of a ferromagnetic metal is increased so as to obtain ahigher GMR effect with higher sensitivity, and to improve MRcharacteristics in a low magnetic field by removing the effect ofcrystal magnetic anisotropy of the ferromagnetic metal.

In order to achieve the object, in one aspect of the present invention,there are provided magnetoresistive materials having a structure inwhich many clusters having a grain size of 20 nm or less and comprisingan amorphous phase containing at least one ferromagnetic metal element Tselected from Fe, Co and Ni as a main component, and at least oneelement M selected from Ti, Zr, Hf, V, Nb, Ta, Mo and W are surroundedby a Cu and/or Ag crystal phase.

In the present invention, the magnetoresistive materials preferably havethe following composition:

    (T.sub.x Q.sub.1-x).sub.100-a M.sub.a

wherein T indicates at least one ferromagnetic metal element selectedfrom Fe, Co and Ni;

Q indicates Cu and/or Ag;

M indicates at least one element selected from Ti, Zr, Hf, V, Nb, Ta, Moand W; and

the composition ratios respectively satisfy the following relations:

0.2≦x≦0.9

(x is a value obtained by dividing the content of element T by the totalamount of elements T and Q)

0.5≦a≦8 (a is by atomic %).

In another aspect of the present invention, there is provided amagnetoresistive multilayer film comprising thin films of amagnetoresistive material, and films of Cu and/or Ag, the two types offilms being alternatively laminated.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic drawing illustrating the texture state of amagnetoresistive material of the present invention;

FIGS. 2A an 2B are schematic sectional views each illustrating amagnetoresistive material of the present invention;

FIG. 3 is a transmission electron microscope photograph of an example ofmagnetoresistive materials of the present invention;

FIG. 4 is a graph showing a magnetic resistance curve obtained in anexample of the present invention;

FIG. 5 is a graph showing a magnetic resistance curve obtained in acomparative example;

FIG. 6 is a schematic drawing illustrating a texture state of aconventional material;

FIG. 7 is a graph showing a theoretical curve of the relation betweenthe volume fraction and the rate of change in resistance offerromagnetic grains;

FIG. 8 is a graph showing a theoretical curve of the relation betweenthe grain size and the rate of change in resistance of ferromagneticgrains;

FIG. 9 is a graph showing the relation between the Co content and therate of change in resistance of a conventional material;

FIG. 10 is a graph showing the relation of magnetic field andresistance; and

FIG. 11 is a schematic drawing illustrating a texture state of aconventional material.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The present invention is described in detail below. FIG. 1 is aschematic drawing illustrating the texture state of an example ofmagnetoresistive materials of the present invention. In FIG. 1,reference numeral 1 denotes an amorphous phase, and reference numeral 2denotes a crystal phase.

Magnetoresistive materials of the present invention have a structure inwhich fine clusters comprising the amorphous phase 1 are surrounded bythe crystal phase 2, as shown in FIG. 1. The amorphous phase 1 containsferromagnetic metal element T (Fe, Co or Ni) as a main component, andelement M (Ti, Zr, Hf, V, Nb, Ta, Mo or W). The crystal phase 2comprises Cu, Ag or an alloy thereof as a main component, and traceamounts of elements T and M.

Each of the magnetoresistive materials of the present invention can bedeposited on a cooled substrate to form an alloy thin film by using athin film deposition apparatus which employs a general-purpose techniquesuch as sputtering or vapor deposition. As the film depositionapparatus, for example, a radio-frequency double pole sputteringapparatus, a DC sputtering apparatus, a magnetron sputtering apparatus,a three-pole sputtering apparatus, an ion beam sputtering apparatus, anopposed target sputtering apparatus can be employed. A composite targetcan be used as a sputtering target in which chips of Cu, Ag, Zr, Hf orTa are arranged on a Co or Ni--Fe--Co alloy target. The thin film formedis preferably annealed.

The magnetoresistive materials of the present invention can berepresented by (T_(x) Q_(1-x))_(100-a) M_(a) wherein T indicates atleast one ferromagnetic metal element selected from Fe, Co and Ni; Qindicates Cu and/or Ag; and M indicates at least one element selectedfrom Ti, Zr, Hf, V, Nb, Ta, Mo and W.

Element M of the magnetoresistive materials of the present invention hasthe ability to form an amorphous phase, and is capable of renderingamorphous a ferromagnetic metal even in a composition having a highcontent of ferromagnetic metal element T and forming fine clustershaving a grain size of 20 nm or less.

Therefore, even in a composition having a high ferromagnetic metalcontent which makes it impossible to obtain the giant magnetoresistiveeffect due to an increase in the size of crystal grains, the giantmagnetoresistive effect can be obtained due to the fine amorphousclusters comprising a ferromagnetic metal.

Since it is possible to form the fine amorphous clusters in acomposition having a high ferromagnetic metal content, the distancebetween the respective ferromagnetic amorphous clusters with the crystalphase of a nonmagnetic metal (Cu or Ag) therebetween is decreased,thereby causing coupling such as weak static magnetic interactionbetween the respective ferromagnetic amorphous clusters. This candecrease the large magnetic field generally required for reversal ofmagnetization.

Further, since the amorphous clusters are formed without crystallizationof the ferromagnetic metal element, the magnetization process of theferromagnetic amorphous clusters is related to MR characteristics. Sincethe ferromagnetic amorphous clusters have no crystal magneticanisotropy, free rotation of magnetization is possible, and MRcharacteristics in a low magnetic field are improved, in comparison withconventional materials.

As a result of measurement of alloys used as the magnetoresistivematerials of the present invention represented by (T_(x)Q_(1-x))_(100-a) M_(a) with respect to the rate of change in resistancewith composition ratio x of a ferromagnetic metal, it was found thatcomposition ratio x has an optimum range (the range where the rate ofchange in resistance increases to some extent), which is preferably 0.2to 0.9, and more preferably 0.4 to 0.8.

As described above, element M has the function to form the amorphousclusters comprising a ferromagnetic metal when added to the element M,and makes it possible to obtain the giant magnetoresistive effect evenwith a composition having a high ferromagnetic metal content. However, aprobability that conduction electrons are scattered by element M as animpurity is increased.

Therefore, with element M at low composition ratio a, the giantmagnetoresistive effect cannot be obtained with a composition comprisinga ferromagnetic metal within a high content range, as with conventionalmaterials such as Cu--Co alloys or the like. If the composition ratio ais excessively high, the flow of conduction electrons which contributeto the magnetoresistive effect is inhibited, thereby decreasing the rateof change in resistance.

In order to maintain the rate of change in resistance at a level of 2%or more, composition ratio a is preferably 0.5 to 8.

The composition ratio a is more preferably 1 to 6 in order to maintainthe rate of change in resistance at a level of about 4% or more.

Since the magnetoresistive materials of the present invention have theabove-described specified composition, particularly, element M (Ti, Zr,Hf, V, Nb, Ta, Mo or W) having the high ability to form an amorphousphase, the amorphous clusters comprising Fe, Co or Ni as a maincomponent are formed.

The present invention in which a nonmagnetic metal (Cu or Ag) isprecipitated in a network form around the fine amorphous clusterscomprising a ferromagnetic element such as Co, Fe or the like as a maincomponent enables the achievement of the giant magnetoresistive effectin an alloy system having a composition with a high Co or Fe content inwhich the ferromagnetic grains cannot be easily micronized in aconventional material. The present invention also improveslow-magnetic-field MR characteristics by removing the effect of crystalmagnetic anisotropy of the ferromagnetic grains, which causes a problemwith a conventional material.

The texture state of an actual material can be observed by atransmission electron microscope (TEM).

Since a conventional granular GMR material contains a nonmagnetic metal(Cu, Ag or the like) at a high content, ferromagnetic grains 11 in a Cu(Ag) matrix 12 are spaced at large distances, and magnetic (dipole)interaction therebetween hardly acts (shown in FIG. 11). There are thusonly a few combinations in which the directions of magnetization of theadjacent grains are antiparallel without an external magnetic field.Even if the shape of the grains is made flat or elliptical by heattreatment in a magnetic field or tension annealing, only the effect ofdecreasing diamagnetic field of the grains (improving the MR dependenceon magnetic field) is improved, and the MR ratio is hardly improved.This is because resistance is higher in an arrangement in which thedirections of magnetization of adjacent grains are antiparallel.

However, since the materials of the present invention contain aferromagnetic metal element at a high content, the amorphous clusterscomprising the ferromagnetic metal element are spaced at shortdistances, and (dipole) static magnetic interaction thus acts betweenthe clusters, thereby causing some degree of weak bonding therebetween.The magnetoresistive materials of the present invention thus exhibitless superparamagnetic behavior, the improved dependence on magneticfields, and changes in magnetoresistance with good sensitivity.

A magnetoresistive multilayer film of the present invention will now bedescribed.

Referring to FIGS. 2A and 2B, the magnetoresistive multilayer film ofthe present invention comprises thin films 16, each comprising amagnetoresistive material consisting of the above-describedferromagnetic amorphous clusters 10 and Au or Ag precipitates 14 aroundthe clusters; and nonmagnetic thin films 18, each comprising Cu and/orAg; the two types of films 16 and 18 being alternately laminated.

FIG. 2A shows a film in which each of the nonmagnetic thin films 18comprises the same material as the precipitates produced around theferromagnetic amorphous clusters 10, and FIG. 2B shows a film in whicheach of the nonmagnetic thin films 18 comprises a material differentfrom the precipitates produced around the ferromagnetic amorphousclusters 10.

Such multilayer film structures permit the formation of theferromagnetic amorphous clusters in a flat phase comprising Co(--Fe,--Ni)-M, and simplifies static magnetic interaction acting to causeantiparallel magnetization directions of the adjacent ferromagneticamorphous clusters, thereby facilitating the interaction. It is thuspossible to efficiently realize antiparallel directions ofmagnetization, improve the MR ratio and response (sensitivity) of the MRmaterial to a magnetic field in the direction of the film plane, andstabilize the MR characteristics.

A more preferable structure is the structure shown in FIG. 2B in whichthe magnetoresistive material thin films 16 each comprise the Agprecipitates 14 produced around the amorphous clusters 10 consisting ofthe main component Co, and the nonmagnetic thin films 18 consisting ofCu are interposed between the respective thin films 16. This structurepermits the formation of a network Ag crystal phase around the Co-basedamorphous clusters 10 because Ag and Co have a strong tendency of phaseseparation, and the formation of a magnetoresistive multilayer filmhaving excellent characteristics because a combination of Cu and Coexhibits the large GMR effect.

In such a multilayer film, the thin films 16 comprising amagnetoresistive material preferably have a thickness within the rangeof 0.7 to 20 nm, and the nonmagnetic thin films 18 interposed betweenthe respective thin films 16 preferably have a thickness of within therange of 1.0 to 10 nm.

If the thin films 16 comprising a magnetoresistive material have athickness of less than 0.7 nm, the ferromagnetic properties of theamorphous clusters 10 cannot be easily maintained. If the thickness isover 20 nm, since a plurality of amorphous clusters 10 are formed in thesame layer and overlapped each other in the direction of the thicknessthereof, the characteristics of the multilayer film become similar tothose of a single layer film, thereby interfering with the effect ofimproving MR characteristics of the multilayer structure.

If the thickness of the nonmagnetic metal thin films 18 is less than 1.5nm, the exchange interaction between the respective magnetoresistivematerial thin films 16 exhibiting ferromagnetic properties is enhanced,thereby causing difficulties in an action in a low magnetic field, i.e.,necessitating a strong magnetic field for a change in resistance. If thethickness is over 10 nm, there is an increase in the probability thatconduction electrons pass through the nonmagnetic thin films 18 havinghigh conductivity without being scattered in the interfaces between themagnetoresistive material thin films 16 and the nonmagnetic thin films18. Namely, the ratio of electrons which do not contribute to the GMReffect is increased, and the magnetoresistive effect is decreased.

The distances (denoted by w in FIG. 2A) between the respective amorphousclusters 10 in each of the magnetoresistive material thin films 16 arepreferably within the range of 0.3 to 10 nm.

If the distances between the respective amorphous clusters are less than0.3 nm, direct exchange coupling between the respective amorphousclusters cannot be cut 16 off. In this case, the magnetoresistivematerial thin films 16 consequently behave as thin films in which theferromagnetic amorphous clusters are continued. If the distances areover 10 nm, there is an increase in the probability that the relativepositional relation of the clusters 10 in the adjacent magnetoresistivematerial thin films 16 with the nonmagnetic thin film 18 therebetween isdeviated. This is undesirable for effectively achieving static magneticcoupling of the amorphous clusters 10 in the adjacent magnetoresistivematerial thin films 16 with the nonmagnetic thin films 18 therebetween.

FIG. 3 is a transmission electron microscope (TEM) photograph of analloy thin film having the composition Co₇₁.2 Ag₂₄.5 Hf₄.3 correspondingto the magnetoresistive materials of the present invention.

The alloy thin film tested was formed by using a radio-frequencydouble-pole sputtering apparatus under conditions in that theradio-frequency input was 2.4×10⁴ W/m², the Ar gas pressure was 5 mTorr,a substrate was cooled with water during film formation. The film formedwas then annealed at 400° C. for 1 hour.

In this thin film, many amorphous clusters of about 10 nm or less, whichare surrounded by a crystal phase, were observed.

As a result of EDS analysis (energy dispersive characteristic X-rayspectroscopic analysis), it was found that the amorphous clusterscomprise a Co-rich phase, which is probably a Co--Hf alloy consisting ofCo as a main component, and that the crystal phase comprises an Ag-richphase, which is probably a Ag--Co--Hf alloy consisting of Ag as a maincomponent.

The alloy thin film of Co₇₁.2 Ag₂₄.5 Hf₄.3 was measured with respect tochanges in magnetoresistance with external magnetic fields. The resultsobtained are shown in FIG. 4.

An alloy thin film of Co₇₁.2 Ag₂₄.5 Hf₄.3 was formed as a comparativeexample, and then measured with respect to changes in magnetoresistancewith external magnetic fields. This alloy film of the comparativeexample was formed by using a composite target comprising a Co targetand Ag chips arranged thereon, and a radio-frequency double-polesputtering apparatus. The results obtained are shown in FIG. 5.

These results indicate that although the comparative example shows amagnetoresistance curve having a half width of about 7.1 kOe, themagnetoresistive material of the present invention shows amagnetoresistance curve having a half width of about 1.8 kOe, and issignificantly improved in MR characteristics in a low magnetic field.

Since magnetoresistive materials used for magnetic heads and sensors arerequired to have soft magnetic characterstics from the viewpoint ofsensitvity, it is obvious that the material of the present invention hasexcellent soft magnetic characteristics.

As described above, the magnetoresistive materials of the presentinvention have a structure in which many clusters having a grain size of20 nm or less and comprising an amorphous phase containing at least oneferromagnetic metal element T selected from Fe, Co and Ni as a maincomponent, and at least one element M selected from Ti, Zr, Hf, V, Nb,Ta, Mo and W are surrounded by a crystal phase of Cu and/or Ag.

The magnetoresistive materials in another embodiment of the presentinvention has the following composition:

    (T.sub.x Q.sub.1-x)100.sub.-a M.sub.a ;

wherein T indicates at least one ferromagnetic metal element selectedfrom Fe, Co and Ni;

Q indicates Cu and/or Ag;

M indicates at least one element selected from Ti, Zr, Hf, V, Nb, Ta, Moand W; and

the composition ratios respectively satisfy the following relations:

0.2≦x≦0.9

(x is a value obtained by dividing the content of element T by the totalamount of content of elements T and Q)

0.5≦a≦8 (a is by atomic %).

The magnetoresistive materials of the present invention permit anincrease in the content of the ferromagnetic metal element whilemaintaining the fine size of the ferromagnetic amorphous clustersconsisting of Fe, Co or Ni as a main component, and exhibit the largemagnetoresistive effect.

Since the amorphous clusters consisting of a ferromagnetic metal elementas a main component have no crystal magnetic anisotropy, themagnetoresistive effect in a low magnetic field can be improved.

Therefore, it is possible to obtain a high-sensitivity magnetic head andmagnetic sensor which produce high output at lower magnetic fields.

The magnetoresistive multilayer film of the present invention comprisesthin films each comprising a magnetoresistive material of the presentinvention, and thin films comprising Cu and/or Ag, the two types offilms being alternately laminated.

The magnetoresistive multilayer film of the present invention is capableof efficiently realizing antiparallel directions of magnetization,improving the MR ratio and response (sensitivity) of the MR material toa magnetic field in the direction of the film plane, and stabilizing theMR effect.

What is claimed is:
 1. A magnetoresistive multilayer film comprisingfirst thin films alternately laminated with second thin films,each ofthe first thin films comprising a magnetoresistive material having astructure in which a plurality of clusters are surrounded by a crystalphase including at least one of Cu and Ag, each of the clusters having agrain size of 20 nm or less and comprising an amorphous phase containingat least one ferromagnetic metal element T selected from the groupconsisting of Fe, Co and Ni, and at least one element M selected fromthe group consisting of Ti, Zr, Hf, V, Nb, Ta, Mo and W, each of thesecond thin films comprising at least one of Cu and Ag; wherein each ofthe first thin films satisfies the following composition:

    (T.sub.x Q.sub.1-x).sub.100 M.sub.a ;

wherein Q indicates Cu and/or Ag; and wherein the composition satisfiesthe following relations:0.2≦x≦0.9, where x is a value obtained bydividing a content of element T by a total amount of content of elementsT and Q; and 0.5≦a≦8, where a is in atomic %.